UV Lithography

Application

Nanoparticle coating / photoresist coating for kit production in biotechnology and MEMS

Technical specifications table

Technical specifications LMA-M-11 LMA-A-11
User panel Character display with simple user keys "4.3 :HMI
Exposure wavelength 365 nm (Flexible) 365 nm (Flexible)
Exposure area A circle with a diameter = 11 cm A circle with a diameter = 11 cm
light intensity 1 - 10 mW/cm^2 1 - 10 mW/cm^2
Parallel error of light radiation angle Less than 1 degree (simulated and optimized optics) Less than 1 degree (simulated and optimized optics)
Exposure modes Continuous and pulsed exposure with accurate and programmable timing Continuous and pulsed exposure with accurate and programmable timing
The Movement of the alignment module Motion with micrometre with 5 um resolution for X, Y, Z and amplitude ±15 mm, rotation axis ± 5 ° and accuracy 0.1 ° Motorized motion with 0.2 resolution and amplitude ± 15 mm, ±15 rotation axis degree and 0.03 degree accuracy
Camera movement Manual movement on axes X,Y Motorized movement in axes X, Y
Camera specifications 400-40x magnification, HDMI and USB output with axial pliers light to increase image resolution 400-40x magnification, HDMI and USB output with axial pliers light to increase image resolution
features Dry vacuum pump Dry vacuum pump
Use chuck Vacuum suitable for substrates with different sizes Use chuck Vacuum suitable for substrates with different sizes
English