Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material is applied on the center of the substrate, which is either spinning at low speed or not spinning at all. The substrate is then rotated at speed up to 10,000 rpm to spread the coating material by centrifugal force. A machine used for spin coating is called a spin coater, or simply spinner.
Our device is designed in a way that it can be easily clean and wash without opening it which may damage sensitive internal elements.
Application
Nanoparticle coating
photoresist coating for kit production in biotechnology and MEMS
Technical specifications table
Technical specifications | NM-SC-9000 |
---|---|
Display | “ 7 :HMI |
Number of programs that can be stored | 20 program(create,edit and delete work profiles) |
The number of program step | 8 |
Speed range | 100-200 |
The Acceleration Range | 1 -2000 Rpm/Sec |
Body Material | Stainless Steel 304 |
Material of the tank and the lid of the chamber | Polyethylene |
Substrate Storage Mechanism | vacuum |
Input Power | 220 V |
Weight | 13Kg |
Dimension | 27 cm× 30 cm × 42 cm |
Features | 16 liter dry vacuum pump providing different types of polyamide slits with different sizes to suit the user's needs |